Patents/Inventors

Chih-wei Wen

HsinchuTW21 patents

21 Patents

US125817542026
Method and Apparatus to Enhance Semiconductor Device Manufacturing
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US125324002026
EUV Source with Rotation Crucible and Laser and Tin (SN) Auto-filling Method
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US124875312025
Extreme Ultraviolet (EUV) Radiation Source Apparatus, EUV Lithography System, and Method for Generating Extreme Ultraviolet Radiation
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US124227442025
Photomask Inspection Method and Apparatus Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
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US124055272025
Photomask, Method of Fabricating a Photomask, and Method of Fabricating a Semiconductor Structure Using a Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US123994392025
Pellicle, Pellicle Removal Tool, and Method of Utilizing Pellicle and Pellicle Removal Tool
Taiwan Semiconductor Manufacturing Co., Ltd.
0 cites
US124008902025
Apparatus for Fabricating a Semiconductor Device and Method for Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US122822642025
Cleaning Apparatus for Cleaning Surface of Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
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US122421822025
Method for Removing Particles from Pellicle and Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
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US121892832025
Particle Prevention Method in Reticle Pod
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US121533412024
Cleaning Method, Method for Forming Semiconductor Structure and System Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US121247582024
Multi-host System and Operation Sharing Method
GENESYS LOGIC, Inc.
0 cites
US120858482024
Photomask Cleaning Tool
Taiwan Semiconductor Manufacturing Company, Ltd.
0 cites
US120726212024
Photomask Inspection Method and Apparatus Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US120092382024
Apparatus for Fabricating a Semiconductor Device and Method for Fabricating Semiconductor Device
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US118222312023
Method for Removing Particles from Pellicle and Photomask
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US118090762023
Cleaning Method, Method for Forming Semiconductor Structure and System Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
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US117037522023
Method of Accelerated Hazing of Mask Assembly
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US117037542023
Particle Prevention Method in Reticle Pod
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US116146842023
Photomask Inspection Method and Apparatus Thereof
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY Ltd.
0 cites
US115858322023
Probe Card and Probe Module Thereof
MPI CORPORATION
0 cites