Chia-yang Liao

3 Patents

• US122182162025

  Method for Manufacturing Semiconductor Devices Having Gate Spacers with Bottom Portions Recessed in a Fin

  Taiwan Semiconductor Manufacturing Company, Ltd.

  0 cites
• US121258912024

  Semiconductor Device Having Gate Spacers Extending Below a Fin Top Surface

  Taiwan Semiconductor Manufacturing Co., Ltd.

  0 cites
• US118548252023

  Gate Structure of Semiconductor Device and Method for Forming the Same

  TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.

  0 cites