3 Patents
- US123052782025Method of Reducing Titanium Nitride Etching During Tungsten Film Formation
Applied Materials, Inc.
0 cites - US120625452024Fluorine-free Tungsten ALD for Dielectric Selectivity Improvement
Applied Materials, Inc.
0 cites - US118307252023Method of Cleaning a Structure and Method of Depositing a Capping Layer in a Structure
Applied Materials, Inc.
0 cites