Patents/Inventors

Charlotte Cutler

Albany, NYUS6 patents

6 Patents

US125435422026
Patterning Method Using Secondary Resist Surface Functionalization for Mask Formation
Tokyo Electron Limited
0 cites
US124555072025
Method for Removing Material Overburden via Enhanced Freeze-less Anti-spacer Formation Using a Bilayer System
Tokyo Electron Limited
0 cites
US124114122025
Patterning Semiconductor Features
Toyko Electron Limited
0 cites
US123946182025
Method of Adjusting Wafer Shape Using Multi-directional Actuation Films
Tokyo Electron Limited
0 cites
US122822542025
Photoresist Compositions and Pattern Formation Methods
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
0 cites
US117477332023
Freeze-less Methods for Self-aligned Double Patterning
TOKYO ELECTRON LIMITED
0 cites