Patents/Inventors

Charles Dezelah

HelsinkiFI49 patents

44 Patents

US125989682026
Method of Forming Patterned Structures
ASM IP Holding, B.V.
0 cites
US125710952026
Low Temperature Flowable Vanadium Oxide Gap Fill
ASM IP Holding B.V.
0 cites
US125639832026
Method of Forming Structures Including a Vanadium or Indium Layer
ASM IP Holding B.V.
0 cites
US125459992026
Method of Depositing Vanadium Metal
ASM IP Holding B.V.
0 cites
US125506422026
Deposition of Boron Nitride Films Using Hydrazido-based Precursors
ASM IP Holding, B.V.
0 cites
US125403872026
Simultaneous Selective Deposition of Two Different Materials on Two Different Surfaces
ASM IP Holding B.V.
0 cites
US125046892025
Photosensitive Material and Method of Forming Patterned Structures
ASM IP Holding, B.V.
0 cites
US124826482025
Selective Passivation and Selective Deposition
ASM IP Holding B.V.
0 cites
US124736312025
Simultaneous Selective Deposition of Two Different Materials on Two Different Surfaces
ASM IP Holding B.V.
0 cites
US124761062025
Selective Deposition of Organic Material
ASM IP Holding B.V.
0 cites
US124630942025
Multiple-layer Method and System for Forming Material Within a Gap
ASM IP Holding B.V.
0 cites
US124354172025
Methods and Systems for Forming a Layer Comprising Vanadium and Oxygen
ASM IP Holding B.V.
0 cites
US124216202025
Structures with Boron- and Gallium-doped Silicon Germanium Layers and Methods and Systems for Forming Same
ASM IP Holding B.V.
0 cites
US124045832025
Transition Metal Nitride Deposition Method
ASM IP Holding B.V.
0 cites
US124068812025
Methods and Systems for Filling a Gap
ASM IP Holding B.V.
0 cites
US123946342025
Etch Process and a Processing Assembly
ASM IP Holding, B.V.
0 cites
US123879302025
Method and Wafer Processing Furnace for Forming an Epitaxial Stack of Semiconductor Epitaxial Layers on a Plurality of Substrates
ASM IP Holding B.V.
0 cites
US123659842025
Transition Metal Deposition Processes and Deposition Assembly
ASM IP Holding B.V.
0 cites
US123621712025
Methods and Systems for Forming a Layer Comprising Aluminum, Titanium, and Carbon
ASM IP Holding B.V.
0 cites
US123519022025
Methods and Systems for Delivery of Vanadium Compounds
ASM IP Holding B.V.
0 cites
US122975372025
Compounds and Methods for Selectively Forming Metal-containing Films
MERCK PATENT GmbH
0 cites
US122864492025
Metal Complexes Containing Cyclopentadienyl Ligands
MERCK PATENT GmbH
0 cites
US122437472025
Methods of Forming Structures Including Vanadium Boride and Vanadium Phosphide Layers
ASM IP Holding B.V.
0 cites
US122345482025
Methods of Forming Copper Iodide Layer and Structures Including Copper Iodide Layer
ASM IP Holding B.V.
0 cites
US122371712025
Method of Forming Vanadium Nitride Layer and Structure Including the Vanadium Nitride Layer
ASM IP Holding B.V.
0 cites
US122278352025
Selective Deposition of Material Comprising Silicon and Oxygen Using Plasma
ASM IP Holding B.V.
0 cites
US122213572025
Methods and Apparatus for Stabilizing Vanadium Compounds
ASM IP Holding B.V.
0 cites
US122154162025
Methods for Depositing a Molybdenum Nitride Film on a Surface of a Substrate by a Cyclical Deposition Process and Related Semiconductor Device Structures Including a Molybdenum Nitride Film
ASM IP Holding B.V.
0 cites
US122179542025
Method of Cleaning a Surface
ASM IP Holding B.V.
0 cites
US121597882024
Method of Forming Structures for Threshold Voltage Control
ASM IP Holding B.V.
0 cites
US121486092024
Silicon Oxide Deposition Method
ASM IP Holding B.V.
0 cites
US121042442024
Methods and Systems for Filling a Gap
ASM IP Holding B.V.
0 cites
US120875862024
Method of Forming Chromium Nitride Layer and Structure Including the Chromium Nitride Layer
ASM IP Holding B.V.
0 cites
US120401952024
Atomic Layer Etching
ASM IP Holding B.V.
0 cites
US120312062024
Methods and Systems for Forming a Layer Comprising a Transitional Metal and a Group 13 Element
ASM IP Holding, B.V.
0 cites
US119962862024
Silicon Precursors for Silicon Nitride Deposition
ASM IP Holding B.V.
0 cites
US118850132024
Method of Forming Vanadium Nitride Layer and Structure Including the Vanadium Nitride Layer
ASM IP Holding B.V.
0 cites
US118850142024
Transition Metal Nitride Deposition Method
ASM IP Holding B.V.
0 cites
US118850202024
Transition Metal Deposition Method
ASM IP Holding B.V.
0 cites
US118735572024
Method of Depositing Vanadium Metal
ASM IP Holding B.V.
0 cites
US118279782023
Methods for Depositing a Molybdenum Nitride Film on a Surface of a Substrate by a Cyclical Deposition Process and Related Semiconductor Device Structures Including a Molybdenum Nitride Film
ASM IP Holding B.V.
0 cites
US116642222023
Atomic Layer Deposition of Indium Gallium Zinc Oxide
ASM IP Holding, B.V.
0 cites
US116085572023
Simultaneous Selective Deposition of Two Different Materials on Two Different Surfaces
ASM IP HOLDING B.V.
0 cites
US115748132023
Atomic Layer Etching
ASM IP HOLDING B.V.
0 cites