7 Patents
- US123460222025Method of Fabricating Pellicle Structure
Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
0 cites - US122812432025Method of Removing an Adhesive for an EUV Mask and Method of Reusing an EUV Mask
FINE SEMITECH Corp.
0 cites - US122584942025Adhesive for Pellicle, Pellicle for Photo Mask and Method for Manufacturing the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US120992932024Phase Shift Mask for Extreme Ultraviolet Lithography and a Method of Manufacturing a Semiconductor Device Using the Same
Samsung Electronics Co., Ltd.
0 cites - US120726372024Lithography Method Using Multi-scale Simulation, Semiconductor Device Manufacturing Method and Exposure Equipment
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
0 cites - US120322812024Pellicle Cleaning Apparatus and Pellicle Cleaning Method Using the Same
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
0 cites - US116626652023Lithography Method Using Multiscale Simulation, and Method of Manufacturing Semiconductor Device and Exposure Equipment Based on the Lithography Method
Seoul National University R&DB Foundation
0 cites