9 Patents
- US122697532025Ternary Paraelectric Material with Space Group Cc and Method of Manufacturing the Same
Samsung Electronics Co., Ltd.
0 cites - US119461542024Dielectric Material, Device Comprising Dielectric Material, and Method of Preparing Dielectric Material
Samsung Electronics Co., Ltd.
0 cites - US118588292024Ternary Paraelectric Material with Space Group Cc and Method of Manufacturing the Same
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US118238382023Two-dimensional Perovskite Material, Dielectric Material and Multi-layered Capacitor Including the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US118240812023Dielectric Thin Film, Integrated Device Including the Same, and Method of Manufacturing the Dielectric Thin Film
Samsung Electronics Co., Ltd.
0 cites - US117913732023Dielectric Thin Film, Capacitor Including the Dielectric Thin Film, and Method for Manufacturing the Dielectric Thin Film
Samsung Electronics Co., Ltd.
0 cites - US117639892023Dielectric Monolayer Thin Film, Capacitor and Semiconductor Device Each Including the Same, and Method of Forming the Dielectric Monolayer Thin Film
Samsung Electronics Co., Ltd.
0 cites - US116644142023Single Crystal Material and Method of Forming the Same and Stacked Structure and Ceramic Electronic Component and Device
SAMSUNG ELECTRONICS CO., Ltd.
0 cites