Patents/Inventors

Byoung Ho Kwon

Changwon-siKR1 patent

2 Patents

US119869212024
Chemical Mechanical Polishing Apparatus, Chemical Mechanical Polishing Method and Method for Fabricating Semiconductor Device
SAMSUNG ELECTRONICS CO., Ltd.
0 cites
US116370192023
Method for Forming a Semiconductor Device Having Protrusion Structures on a Substrate and a Planarized Capping Insulating Layer on the Protrusion Structures
Samsung Electronics Co., Ltd.
0 cites