Patents/Inventors

Byeong Chan Lee

San Jose, CAUS2 patents

3 Patents

US123277612025
Void-free Contact Trench Fill in Gate-all-around FET Architecture
APPLIED MATERIALS, Inc.
0 cites
US122848032025
System and Methods for Dram Contact Formation
APPLIED MATERIALS, Inc.
0 cites
US119234412024
Gate All Around I/O Engineering
Applied Materials, Inc.
0 cites