8 Patents
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- US123026322025Non-planar Integrated Circuit Structures Having Mitigated Source or Drain Etch from Replacement Gate Process
Intel Corporation
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- US118943682024Gate-all-around Integrated Circuit Structures Fabricated Using Alternate Etch Selective Material
Intel Corporation
0 cites - US118698912024Non-planar Integrated Circuit Structures Having Mitigated Source or Drain Etch from Replacement Gate Process
Intel Corporation
0 cites - 0 cites
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