13 Patents
- US125507252026Structure for Galvanic Isolation Using Dielectric-filled Trench in Substrate Below Electrode
Globalfoundries Singapore Pte. Ltd.
0 cites - 0 cites
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- US123362202025Extended-drain Metal-oxide-semiconductor Devices with a Gap Between the Drain and Body Wells
Globalfoundries Singapore Pte. Ltd.
0 cites - 0 cites
- US121913512025Laterally-diffused Metal-oxide-semiconductor Devices with an Air Gap
Globalfoundries Singapore Pte. Ltd.
0 cites - 0 cites
- US119555142024Field-effect Transistors with a Gate Structure in a Dual-depth Trench Isolation Structure
Globalfoundries U.S. Inc.
0 cites - US118626932024Semiconductor Devices Including a Drain Captive Structure Having an Air Gap and Methods of Forming the Same
GLOBALFOUNDRIES Singapore Pte. Ltd.
0 cites - US117913792023Galvanic Isolation Using Isolation Break Between Redistribution Layer Electrodes
GLOBALFOUNDRIES SINGAPORE PTE Ltd
0 cites - US117913922023Extended-drain Metal-oxide-semiconductor Devices with a Notched Gate Electrode
Globalfoundries Singapore Pte. Ltd.
0 cites - 0 cites
- US116582402023Semiconductor Transistors on Multi-layered Substrates
GLOBALFOUNDRIES SINGAPORE PTE. Ltd.
0 cites