10 Patents
- US125384992026Semiconductor Device Including Dielectric Layer and Method of Forming the Same
SAMSUNG ELECTRONICS CO., Ltd.
0 cites - US125016312025Capacitor, and Device Comprising the Same, and Method of Preparing the Same
Samsung Electronics Co., Ltd.
0 cites - US124777572025Capacitor, Semiconductor Device Comprising the Capacitor, and Method of Fabricating the Capacitor
Samsung Electronics Co., Ltd.
0 cites - US121913482025Capacitors of Semiconductor Device Capable of Operating in High Frequency Operation Environment
Samsung Electronics Co., Ltd.
0 cites - US120517172024Anti-ferroelectric Thin-film Structure and Electronic Device Including the Same
Samsung Electronics Co., Ltd
0 cites - US120340362024Semiconductor Device and Semiconductor Apparatus Including the Same
Samsung Electronics Co., Ltd.
0 cites - US119800232024Capacitor, Method of Controlling the Same, and Transistor Including the Same
Samsung Electronics Co., Ltd.
0 cites - 0 cites
- US117913722023Capacitors of Semiconductor Device Capable of Operating in High Frequency Operation Environment
Samsung Electronics Co., Ltd.
0 cites - US117658872023Capacitor, Method of Controlling the Same, and Transistor Including the Same
Samsung Electronics Co., Ltd.
0 cites