Blake W. Erickson

5 Patents

• US124696862025

  Process Characterization and Correction Using Optical Wall Process Sensor (OWPS)

  Applied Materials, Inc.

  0 cites
• US124427652025

  Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry

  Applied Materials, Inc.

  0 cites
• US120805742024

  Low Open Area and Coupon Endpoint Detection

  Applied Materials, Inc.

  0 cites
• US120319102024

  Transmission Corrected Plasma Emission Using In-situ Optical Reflectometry

  Applied Materials, Inc.

  0 cites
• US120091912024

  Thin Film, In-situ Measurement Through Transparent Crystal and Transparent Substrate Within Processing Chamber Wall

  Applied Materials, Inc.

  0 cites