Patents/Inventors

Bhaskar Jyoti Bhuyan

San Jose, CAUS49 patents

45 Patents

US126107912026
Method of Forming Carbon-based Spacer for EUV Photoresist Patterns
Applied Materials, Inc.
0 cites
US125989692026
Flexible Monomer for Smooth Polymer Surface
Applied Materials, Inc.
0 cites
US125936292026
Selective Deposition Processes on Semiconductor Substrates
Applied Materials, Inc.
0 cites
US125688032026
Methods of Forming Interconnect Structures
Applied Materials, Inc.
0 cites
US125506432026
Oxidants and Strained-ring Precursors
National University Of Singapore
0 cites
US125000802025
Systems and Methods for Depositing Low-k Dielectric Films
Applied Materials, Inc.
0 cites
US124733162025
Molybdenum (0) Precursors for Deposition of Molybdenum Films
National University Of Singapore
0 cites
US124354112025
Metal Organonitrile Precursors for Thin Film Deposition
Wayne State University
0 cites
US124380502025
Electronic Device Fabrication Using Area-selective Deposition
Applied Materials, Inc.
0 cites
US124158242025
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US123343942025
Methods and Apparatus for Selective Etch Stop Capping and Selective via Open for Fully Landed via on Underlying Metal
APPLIED MATERIALS, Inc.
0 cites
US123004912025
Deposition of Semiconductor Integration Films
Applied Materials, Inc.
0 cites
US122917792025
Methods of Selective Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US122813822025
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US122725512025
Selective Metal Removal with Flowable Polymer
Applied Materials, Inc.
0 cites
US122610492025
Selective Etch of a Substrate
Applied Materials , Inc.
0 cites
US121424772024
Chalcogen Precursors for Deposition of Silicon Nitride
Applied Materials, Inc.
0 cites
US121319002024
Methods for Depositing Blocking Layers on Metal Surfaces
Applied Materials, Inc.
0 cites
US121105842024
Low Temperature Growth of Transition Metal Chalcogenides
Applied Materials, Inc.
0 cites
US120947662024
Selective Blocking of Metal Surfaces Using Bifunctional Self-assembled Monolayers
Applied Materials, Inc.
0 cites
US120681702024
Vapor Phase Thermal Etch Solutions for Metal Oxo Photoresists
Applied Materials, Inc.
0 cites
US120603702024
Molybdenum (0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US120404272024
Preclean and Encapsulation of Microled Features
Applied Materials, Inc.
0 cites
US120312092024
Reducing Agents for Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US120338662024
Vapor Phase Thermal Etch Solutions for Metal Oxo Photoresists
Applied Materials, Inc.
0 cites
US120149252024
Metal-doped Carbon Hardmasks
Applied Materials, Inc.
0 cites
US119878752024
Semiconductor Device Patterning Methods
Applied Materials, Inc.
0 cites
US119903322024
Methods and Apparatus for Deposition of Low-k Films
Applied Materials, Inc.
0 cites
US119903692024
Selective Patterning with Molecular Layer Deposition
Applied Materials, Inc.
0 cites
US119707772024
Deposition of Low-k Films
Applied Materials, Inc.
0 cites
US119729402024
Area Selective Carbon-based Film Deposition
Applied Materials, Inc.
0 cites
US118861202024
Deposition of Semiconductor Integration Films
Applied Materials, Inc.
0 cites
US118592782024
Molecular Layer Deposition of Amorphous Carbon Films
Applied Materials, Inc.
0 cites
US118482292023
Selective Blocking of Metal Surfaces Using Bifunctional Self-assembled Monolayers
Applied Materials, Inc.
0 cites
US118210852023
Methods of Selective Atomic Layer Deposition
APPLIED MATERIALS, Inc.
0 cites
US118238932023
Methods of Depositing Sicon with C, O, and N Compositional Control
APPLIED MATERIALS, Inc.
0 cites
US117607682023
Molybdenum(0) Precursors for Deposition of Molybdenum Films
Applied Materials, Inc.
0 cites
US117567852023
Molecular Layer Deposition Contact Landing Protection for 3D NAND
Applied Materials, Inc.
0 cites
US117323562023
Multilayer Encapsulation Stacks by Atomic Layer Deposition
Applied Materials, Inc.
0 cites
US117027332023
Methods for Depositing Blocking Layers on Conductive Surfaces
Applied Materials, Inc.
0 cites
US116580252023
Chalcogen Precursors for Deposition of Silicon Nitride
Applied Materials, Inc.
0 cites
US116211612023
Selective Deposition of a Passivation Film on a Metal Surface
Applied Materials, Inc.
0 cites
US116211722023
Vapor Phase Thermal Etch Solutions for Metal Oxo Photoresists
Applied Materials, Inc.
0 cites
US115629042023
Deposition of Semiconductor Integration Films
Applied Materials, Inc.
0 cites
US115491812023
Methods for Atomic Layer Deposition of Sico(n) Using Halogenated Silylamides
Applied Materials, Inc.
0 cites