20 Patents
- US125504012026Doped STI to Reduce Source/drain Diffusion for Germanium NMOS Transistors
Intel Corporation
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- US118944652024Deep Gate-all-around Semiconductor Device Having Germanium or Group III-V Active Layer
Google LLC
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- US117356702023Non-selective Epitaxial Source/drain Deposition to Reduce Dopant Diffusion for Germanium NMOS Transistors
Intel Corporation
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