Patents/Inventors

Bart J. Van Schravendijk

Palo Alto, CAUS18 patents

18 Patents

US125989302026
Conformal Thermal CVD with Controlled Film Properties and High Deposition Rate
Lam Research Corporation
0 cites
US124513462025
Modulated Atomic Layer Deposition
Lam Research Corporation
0 cites
US124179432025
Reducing Intralevel Capacitance in Semiconductor Devices
Lam Research Corporation
0 cites
US124127422025
Impurity Reduction in Silicon-containing Films
Lam Research Corporation
0 cites
US123851382025
Plasma-enhanced Deposition of Film Stacks
Novellus Systems, Inc.
0 cites
US123410022025
Low Stress Films for Advanced Semiconductor Applications
Lam Research Corporation
0 cites
US122610382025
Gapfill of Variable Aspect Ratio Features with a Composite PEALD and PECVD Method
Lam Research Corporation
0 cites
US121257052024
Method for Providing Doped Silicon Using a Diffusion Barrier Layer
LAM RESEARCH CORPORATION
0 cites
US121129802024
Method to Create Air Gaps
Lam Research Corporation
0 cites
US120875722024
Etch Stop Layer
Lam Research Corporation
0 cites
US120875732024
Modulation of Oxidation Profile for Substrate Processing
Lam Research Corporation
0 cites
US120805922024
Film Stack Simplification for High Aspect Ratio Patterning and Vertical Scaling
Lam Research Corporation
0 cites
US120515892024
Tin Oxide Thin Film Spacers in Semiconductor Device Manufacturing
Lam Research Corporation
0 cites
US120376862024
Selective Carbon Deposition
Lam Research Corporation
0 cites
US120401812024
Modulated Atomic Layer Deposition
Lam Research Corporation
0 cites
US119202392024
Minimizing Radical Recombination Using ALD Silicon Oxide Surface Coating with Intermittent Restoration Plasma
Lam Research Corporation
0 cites
US117840472023
Tin Oxide Thin Film Spacers in Semiconductor Device Manufacturing
Lam Research Corporation
0 cites
US116370372023
Method to Create Air Gaps
Lam Research Corporation
0 cites