4 Patents
- US124916042025Chemical Mechanical Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US124475812025Chemical Mechanical Planarization Pad Having Polishing Layer with Multi-lobed Embedded Features
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - US122207842025Chemical Mechanical Polishing Pad and Preparation Thereof
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites - 0 cites