9 Patents
- US123659832025Methods for Forming a Boron Nitride Film by a Plasma Enhanced Atomic Layer Deposition Process
ASM IP Holding B.V.
0 cites - US122304972025Methods for Forming a Topographically Selective Silicon Oxide Film by a Cyclical Plasma-enhanced Deposition Process
ASM IP Holding B.V.
0 cites - US116768122023Method for Forming Silicon Nitride Film Selectively on Top/bottom Portions
ASM IP Holding B.V.
0 cites - US116461972023Method for Depositing Silicon-free Carbon-containing Film as Gap-fill Layer by Pulse Plasma-assisted Deposition
ASM IP Holding B.V.
0 cites - 0 cites
- US116263162023Method of Depositing Carbon-containing Material on a Surface of a Substrate, Structure Formed Using the Method, and System for Forming the Structure
ASM IP Holding B.V.
0 cites - US116107742023Methods for Forming a Topographically Selective Silicon Oxide Film by a Cyclical Plasma-enhanced Deposition Process
ASM IP Holding B.V.
0 cites - 0 cites
- 0 cites