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Inventors
Anthony Yen
Hsinchu
TW
3 patents
3 Patents
US12429776
2025
Lithography Method with Reduced Impacts of Mask Defects
TAIWAN SEMICONDUCTOR MANUFACTURING CO., Ltd.
0 cites
US11921434
2024
Mask Cleaning
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites
US11740563
2023
Mask Cleaning
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, Ltd.
0 cites