Patents/Inventors

Annamalai Lakshmanan

Fremont, CAUS4 patents

6 Patents

US124530862025
Low Resistivity Metal Contact Stack
Applied Materials, Inc.
0 cites
US122813872025
Method of Depositing Metal Films
Applied Materials, Inc.
0 cites
US121042432024
Methods and Apparatus for Processing a Substrate
APPLIED MATERIALS, Inc.
0 cites
US120226502024
Low Resistivity DRAM Buried Word Line Stack
Applied Materials, Inc.
0 cites
US115878292023
Doping Control of Metal Nitride Films
APPLIED MATERIALS, Inc.
0 cites
US115879362023
Low Resistivity DRAM Buried Word Line Stack
Applied Materials, Inc.
0 cites