Andreas Lopp

5 Patents

• US125531242026

  Sputter Deposition Source, Magnetron Sputter Cathode, and Method of Depositing a Material on a Substrate

  Applied Materials, Inc.

  0 cites
• US120496912024

  Temperature-controlled Shield, Material Deposition Apparatus and Method for Depositing a Material Onto a Substrate

  APPLIED MATERIALS, Inc.

  0 cites
• US119055892024

  Material Deposition Apparatus Having at Least One Heating Assembly and Method for Pre- And/or Post-heating a Substrate

  Applied Materials, Inc.

  0 cites
• US117323452023

  Vapor Deposition Apparatus and Method for Coating a Substrate in a Vacuum Chamber

  APPLIED MATERIALS, Inc.

  0 cites
• US117189042023

  Mask Arrangement for Masking a Substrate in a Processing Chamber, Apparatus for Depositing a Layer on a Substrate, and Method for Aligning a Mask Arrangement for Masking a Substrate in a Processing Chamber

  Applied Materials, Inc.

  0 cites