Patents/Inventors

Amnon Manassen

HaifaIL63 patents

43 Patents

US126191622026
Extra Tall Target Metrology
KLA Corporation
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US126019792026
Multi-column Large Field of View Imaging Platform
KLA Corporation
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US125852002026
Imaging Overlay with Mutually Coherent Oblique Illumination
KLA Corporation
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US125717242026
Single Wafer Orientation Tool-induced Shift Cleaning
KLA Corporation
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US125608712026
Metrology Target for Scanning Metrology
KLA Corporation
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US125605482026
Spectral Angular Metrology
KLA Corporation
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US125357442026
Overlay Estimation Based on Optical Inspection and Machine Learning
KLA Corporation
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US124223632025
Scanning Scatterometry Overlay Metrology
KLA Corporation
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US123994352025
Grating-over-grating Overlay Measurement with Parallel Color per Layer
KLA Corporation
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US123796692025
Massive Overlay Metrology Sampling with Multiple Measurement Columns
KLA Corporation
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US123723452025
3D Profilometry with a Linnik Interferometer
KLA Corporation
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US123277412025
Oscillating Secondary Stage for Frame-mode Overlay Metrology
KLA Corporation
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US122538052025
Scatterometry Overlay Metrology with Orthogonal Fine-pitch Segmentation
KLA Corporation
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US122355882025
Scanning Overlay Metrology with High Signal to Noise Ratio
KLA Corporation
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US122221992025
Systems and Methods for Measurement of Misregistration and Amelioration Thereof
KLA Corporation
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US121702152024
Systems and Methods for Correction of Impact of Wafer Tilt on Misregistration Measurements
KLA Corporation
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US121659302024
Adaptive Modeling Misregistration Measurement System and Method
KLA Corporation
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US121319592024
Systems and Methods for Improved Metrology for Semiconductor Device Wafers
KLA Corporation
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US121115802024
Optical Metrology Utilizing Short-wave Infrared Wavelengths
KLA Corporation
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US120929662024
Device Feature Specific Edge Placement Error (EPE)
KLA Corporation
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US120786012024
Universal Metrology Model
KLA Corporation
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US120663222024
Single Grab Overlay Measurement of Tall Targets
KLA Corporation
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US120323002024
Imaging Overlay with Mutually Coherent Oblique Illumination
KLA Corporation
0 cites
US120011482024
Enhancing Performance of Overlay Metrology
KLA Corporation
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US119675352024
On-product Overlay Targets
KLA CORPORATION
0 cites
US119337172024
Sensitive Optical Metrology in Scanning and Static Modes
KLA Corporation
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US119218252024
System and Method for Determining Target Feature Focus in Image-based Overlay Metrology
KLA Corporation
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US118993752024
Massive Overlay Metrology Sampling with Multiple Measurement Columns
KLA Corporation
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US118801412024
Method of Measuring Misregistration in the Manufacture of Topographic Semiconductor Device Wafers
KLA CORPORATION
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US118525902023
Systems and Methods for Metrology with Layer-specific Illumination Spectra
KLA Corporation
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US118416212023
Moiré Scatterometry Overlay
KLA Corporation CA
0 cites
US118153472023
Optical Near-field Metrology
Kla-tencor Corporation
0 cites
US118002122023
Multi-directional Overlay Metrology Using Multiple Illumination Parameters and Isolated Imaging
KLA Corporation
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US117840972023
Measurement of Overlay Error Using Device Inspection System
KLA-TENCOR CORPORATION
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US117264102023
Multi-resolution Overlay Metrology Targets
KLA Corporation
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US117195332023
Modulation of Scanning Velocity During Overlay Metrology
KLA Corporation
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US117139592023
Overlay Metrology Using Spectroscopic Phase
KLA Corporation
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US117094332023
Device-like Metrology Targets
Kla-tencor Corporation
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US116444192023
Measurement of Properties of Patterned Photoresist
KLA Corporation
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US116159742023
Fab Management with Dynamic Sampling Plans, Optimized Wafer Measurement Paths and Optimized Wafer Transport, Using Quantum Computing
KLA CORPORATION
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US115927552023
Enhancing Performance of Overlay Metrology
KLA Corporation
0 cites
US115734972023
System and Method for Measuring Misregistration of Semiconductor Device Wafers Utilizing Induced Topography
KLA CORPORATION
0 cites
US115567382023
System and Method for Determining Target Feature Focus in Image-based Overlay Metrology
KLA Corporation
0 cites