Patents/Inventors

Alok Ranjan

Austin, TXUS32 patents

34 Patents

US125882622026
Sacrificial Gate Capping Layer for Gate Protection During Source/drain Contact Opening
Tokyo Electron Limited
0 cites
US125000672025
Apparatus for Edge Control During Plasma Processing
Tokyo Electron Limited
0 cites
US124630112025
Inductively Coupled Plasma Source with Radial Coil Network
Applied Materials Inc.
0 cites
US124513292025
Plasma Processing Apparatus with Tunable Electrical Characteristic
TOKYO ELECTRON LIMITED
0 cites
US124008652025
Pulsed Capacitively Coupled Plasma Processes
Tokyo Electron Limited
0 cites
US123946292025
Plasma Processing Methods Using Low Frequency Bias Pulses
Tokyo Electron Limited
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US123004682025
Method of Uniformity Control
Tokyo Electron Limited
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US123004772025
Autonomous Operation of Plasma Processing Tool
Tokyo Electron Limited
0 cites
US123005002025
Etching of Polycrystalline Semiconductors
Tokyo Electron Limited
0 cites
US122886922025
Method of Forming a FET Structure by Selective Deposition of Film on Source/drain Contact
TOKYO ELECTRON LIMITED
0 cites
US122725202025
Process Control Enabled VDC Sensor for Plasma Process
Tokyo Electron Limited
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US122304752025
Systems and Methods of Control for Plasma Processing
Tokyo Electron Limited
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US122241602025
Topographic Selective Deposition
Tokyo Electron Limited
0 cites
US122179352025
Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses
Tokyo Electron Limited
0 cites
US121892972025
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
Tokyo Electron Limited
0 cites
US121835832024
Remote Source Pulsing with Advanced Pulse Control
Tokyo Electron Limited
0 cites
US121318882024
Gas Cluster Assisted Plasma Processing
TOKYO ELECTRON LIMITED
0 cites
US120572932024
Methods for Real-time Pulse Measurement and Pulse Timing Adjustment to Control Plasma Process Performance
Tokyo Electron Limited
0 cites
US120149012024
Tailored Electron Energy Distribution Function by New Plasma Source: Hybrid Electron Beam and RF Plasma
Tokyo Electron Limited
0 cites
US120094302024
Method for Gate Stack Formation and Etching
Tokyo Electron Limited
0 cites
US119617352024
Cyclic Plasma Processing
Tokyo Electron Limited
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US119423072024
Plasma Processing with Radio Frequency (RF) Source and Bias Signal Waveforms
Tokyo Electron Limited
0 cites
US119159102024
Fast Neutral Generation for Plasma Processing
TOKYO ELECTRON LIMITED
0 cites
US118697562024
Virtual Metrology Enhanced Plasma Process Optimization Method
Tokyo Electron Limited
0 cites
US118323732023
Plasma Processing Apparatus
TOKYO ELECTRON LIMITED
0 cites
US118172952023
Three-phase Pulsing Systems and Methods for Plasma Processing
TOKYO ELECTRON LIMITED
0 cites
US117347832023
System and Method for Detecting On-street Parking Violations
TATA CONSULTANCY SERVICES LIMITED
0 cites
US116997412023
Metal-containing Liner Process
Tokyo Electron Limited
0 cites
US116885862023
Method and Apparatus for Plasma Processing
TOKYO ELECTRON LIMITED
0 cites
US116580372023
Method of Atomic Layer Etching of Oxide
Tokyo Electron Limited
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US116055392023
Defect Correction on Metal Resists
Tokyo Electron Limited
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US116055422023
Method for Dry Etching Compound Materials
TOKYO ELECTRON LIMITED
0 cites
US115574872023
Etching Metal During Processing of a Semiconductor Structure
Tokyo Electron Limited
0 cites
US115453642023
Pulsed Capacitively Coupled Plasma Processes
Tokyo Electron Limited
0 cites