Akitaka Shimizu

4 Patents

• US125000912025

  Etching Method, Method of Removing Etching Residue, and Storage Medium

  Tokyo Electron Limited

  0 cites
• US122371732025

  Substrate Processing Method, Substrate Processing Apparatus and Substrate Processing System

  TOKYO ELECTRON LIMITED

  0 cites
• US121658482024

  Substrate Processing Method, Substrate Processing Apparatus, and Method for Producing Nanowire or Nanosheet Transistor

  Tokyo Electron Limited

  0 cites
• US115574862023

  Etching Method, Damage Layer Removal Method, and Storage Medium

  TOKYO ELECTRON LIMITED

  0 cites