Patents/Inventors

Akira Fujimura

Saratoga, CAUS26 patents

24 Patents

US126140172026
Using Machine Learning to Produce Routes
D2S, Inc.
0 cites
US125793532026
Computing Parasitic Values for Semiconductor Designs
D2S, Inc.
0 cites
US125720822026
Geometric Loading Effect Correction for Lithography
D2S, Inc.
0 cites
US125478042026
Computing and Displaying a Predicted Overlap Shape in an IC Design Based on Predicted Manufacturing Contours
D2S, Inc.
0 cites
US125478032026
Leveraging Concurrency to Improve Interactivity with an EDA Tool
D2S, Inc.
0 cites
US125416342026
Routing Non-preferred Direction Wiring Layers of an Integrated Circuit by Minimizing Vias Between These Layers
D2S, Inc.
0 cites
US124993012025
Computing Parasitic Values for Semiconductor Designs
D2S, Inc.
0 cites
US124881752025
Methods and Systems to Determine Parasitics for Semiconductor or Flat Panel Display Fabrication
D2S, Inc.
0 cites
US124752832025
Generating and Display an Animation of a Predicted Overlap Shape in an IC Design
D2S, Inc.
0 cites
US123870292025
Computing Parasitic Values for Semiconductor Designs
D2S, Inc.
0 cites
US123728642025
Methods and Systems to Determine Shapes for Semiconductor or Flat Panel Display Fabrication
D2S, Inc.
0 cites
US123401642025
Methods and Systems for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US122875672025
Method and System for Reticle Enhancement Technology
D2S, Inc.
0 cites
US122482422025
Methods and Systems for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US122437122025
Method and System for Determining a Charged Particle Beam Exposure for a Local Pattern Density
D2S, Inc.
0 cites
US120199732024
Method for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US119538242024
Method for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US119214202024
Method and System for Reticle Enhancement Technology
D2S, Inc.
0 cites
US118861662024
Method and System of Reducing Charged Particle Beam Write Time
D2S, Inc.
0 cites
US117831102023
Method for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US117567652023
Method and System for Determining a Charged Particle Beam Exposure for a Local Pattern Density
D2S, Inc.
0 cites
US116933062023
Method for Reticle Enhancement Technology of a Design Pattern to Be Manufactured on a Substrate
D2S, Inc.
0 cites
US116044512023
Method and System of Reducing Charged Particle Beam Write Time
D2S, Inc.
0 cites
US115928022023
Method and System of Reducing Charged Particle Beam Write Time
D2S, Inc.
0 cites