Patents/Inventors

Akane Uehara

KyotoJP1 patent

2 Patents

US123302612025
Offset Pore Poromeric Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites
US116670612023
Method of Forming Leveraged Poromeric Polishing Pad
Rohm And Haas Electronic Materials CMP Holdings, Inc.
0 cites