Patents/Inventors

Adrien Lavoie

Newberg, ORUS36 patents

33 Patents

US125989302026
Conformal Thermal CVD with Controlled Film Properties and High Deposition Rate
Lam Research Corporation
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US125312202026
Automated Feedforward and Feedback Sequence for Patterning CD Control
Lam Research Corporation
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US124736332025
Plasma Enhanced Atomic Layer Deposition of Silicon-containing Films
Lam Research Corporation
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US124486872025
Dynamic Precursor Dosing for Atomic Layer Deposition
Lam Research Corporation
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US124513462025
Modulated Atomic Layer Deposition
Lam Research Corporation
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US124216022025
Multi-station Semiconductor Processing with Independently Adjustable Pedestals
Lam Research Corporation
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US124127422025
Impurity Reduction in Silicon-containing Films
Lam Research Corporation
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US123548712025
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
Lam Research Corporation
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US123082642025
Rapid Tuning of Critical Dimension Non-uniformity by Modulating Temperature Transients of Multi-zone Substrate Supports
Lam Research Corporation
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US122781252025
Integrated Dry Processes for Patterning Radiation Photoresist Patterning
Lam Research Corporation
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US122610382025
Gapfill of Variable Aspect Ratio Features with a Composite PEALD and PECVD Method
Lam Research Corporation
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US122093122025
Temperature Control of a Multi-zone Pedestal
LAM RESEARCH CORPORATION
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US121868512025
Use of Vacuum During Transfer of Substrates
Lam Research Corporation
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US121836042024
Integrated Dry Processes for Patterning Radiation Photoresist Patterning
Lam Research Corporation
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US121579452024
Thermal Atomic Layer Deposition of Silicon-containing Films
Lam Research Corporation
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US121425092024
Electrostatic Chuck with Seal Surface
Lam Research Corporation
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US121257052024
Method for Providing Doped Silicon Using a Diffusion Barrier Layer
LAM RESEARCH CORPORATION
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US121105862024
Pedestals for Modulating Film Properties in Atomic Layer Deposition (ALD) Substrate Processing Chambers
LAM RESEARCH CORPORATION
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US120778592024
Variable Cycle and Time RF Activation Method for Film Thickness Matching in a Multi-station Deposition System
Lam Research Corporation
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US120716892024
Trim and Deposition Profile Control with Multi-zone Heated Substrate Support for Multi-patterning Processes
Lam Research Corporation
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US120573002024
Apparatus for Cleaning Plasma Chambers
LAM RESEARCH CORPORATION
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US120496982024
Systems and Methods for Reducing Effluent Build-up in a Pumping Exhaust System
LAM RESEARCH CORPORATION
0 cites
US120496992024
Dielectric Gapfill Using Atomic Layer Deposition (ALD), Inhibitor Plasma and Etching
LAM RESEARCH CORPORATION
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US120376862024
Selective Carbon Deposition
Lam Research Corporation
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US120401812024
Modulated Atomic Layer Deposition
Lam Research Corporation
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US120209232024
Low-κ ALD Gap-fill Methods and Material
Lam Research Corporation
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US119707722024
Dynamic Precursor Dosing for Atomic Layer Deposition
Lam Research Corporation
0 cites
US119591752024
Fill on Demand Ampoule Refill
Lam Research Corporation
0 cites
US119131132024
Method and Apparatus for Modulating Film Uniformity
LAM RESEARCH CORPORATION
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US116705032023
Method of Atomic Layer Deposition
Lam Research Corporation
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US116519632023
Method of Improving Deposition Induced CD Imbalance Using Spatially Selective Ashing of Carbon Based Film
Lam Research Corporation
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US116461982023
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
Lam Research Corporation
0 cites
US115425992023
Method and Apparatus for Providing Station to Station Uniformity
Lam Research Corporation
0 cites