Adam J. Fischbach

4 Patents

• US124566022025

  Semiconductor Processing Chambers and Methods for Deposition and Etch

  Applied Materials, Inc.

  0 cites
• US122058452025

  Semiconductor Processing Chamber to Accommodate Parasitic Plasma Formation

  Applied Materials, Inc.

  0 cites
• US121424592024

  Single Chamber Flowable Film Formation and Treatments

  Applied Materials, Inc.

  0 cites
• US116995712023

  Semiconductor Processing Chambers for Deposition and Etch

  Applied Materials, Inc.

  0 cites