5 Patents
- US123639672025Integration Methods to Fabricate Internal Spacers for Nanowire Devices
Sony Group Corporation
0 cites - US122940272025Semiconductor Device Having Doped Epitaxial Region and Its Methods of Fabrication
Intel Corporation
0 cites - 0 cites
- US119089342024Semiconductor Device Having Doped Epitaxial Region and Its Methods of Fabrication
Intel Corporation
0 cites - US118699392024Integration Methods to Fabricate Internal Spacers for Nanowire Devices
Sony Group Corporation
0 cites