Patents/Inventors

Abhijit Basu Mallick

Sunnyvale, CAUS50 patents

50 Patents

US126107912026
Method of Forming Carbon-based Spacer for EUV Photoresist Patterns
Applied Materials, Inc.
0 cites
US125506512026
Selective Etching of Silicon-containing Material Relative to Metal-doped Boron Films
Applied Materials, Inc.
0 cites
US125347972026
Vapor-phase Precursor Seeding for Diamond Film Deposition
National University Of Singapore
0 cites
US124826462025
Processes for Depositing Sib Films
Applied Materials, Inc.
0 cites
US124630362025
High Density Carbon Films for Patterning Applications
Applied Materials, Inc.
0 cites
US124380502025
Electronic Device Fabrication Using Area-selective Deposition
Applied Materials, Inc.
0 cites
US123810862025
Low Temperature Graphene Growth
Applied Materials, Inc.
0 cites
US123259102025
Deposition of Conformal and Gap-fill Amorphous Silicon Thin-films
Applied Materials, Inc.
0 cites
US123277332025
Methods to Reduce UNCD Film Roughness
National University Of Singapore
0 cites
US121989362025
Defect Free Germanium Oxide Gap Fill
Applied Materials, Inc.
0 cites
US121734132024
High Pressure Oxidation of Metal Films
Applied Materials, Inc.
0 cites
US121105842024
Low Temperature Growth of Transition Metal Chalcogenides
Applied Materials, Inc.
0 cites
US120548272024
Flowable Film Curing Using H2 Plasma
Applied Materials, Inc.
0 cites
US120464682024
Conformal Silicon-germanium Film Deposition
Applied Materials, Inc.
0 cites
US120376792024
Method of Forming a Diamond Film
Applied Materials, Inc.
0 cites
US120183642024
Super-conformal Germanium Oxide Films
Applied Materials, Inc.
0 cites
US120149252024
Metal-doped Carbon Hardmasks
Applied Materials, Inc.
0 cites
US119903692024
Selective Patterning with Molecular Layer Deposition
Applied Materials, Inc.
0 cites
US119786352024
Silicide Films Through Selective Deposition
Applied Materials, Inc.
0 cites
US119729402024
Area Selective Carbon-based Film Deposition
Applied Materials, Inc.
0 cites
US119675242024
3D NAND Gate Stack Reinforcement
Applied Materials, Inc.
0 cites
US119461342024
In Situ Nucleation for Nanocrystalline Diamond Film Deposition
Applied Materials, Inc.
0 cites
US118942302024
Tribological Properties of Diamond Films
Applied Materials, Inc.
0 cites
US118482322023
Method for Si Gap Fill by PECVD
Applied Materials, Inc.
0 cites
US118428972023
High Density Carbon Films for Patterning Applications
Applied Materials, Inc.
0 cites
US118307292023
Low-k Boron Carbonitride Films
Applied Materials, Inc.
0 cites
US118307342023
Thermal Deposition of Silicon-germanium
Applied Materials, Inc.
0 cites
US118173202023
CVD Based Oxide-metal Multi Structure for 3D NAND Memory Devices
Applied Materials, Inc.
0 cites
US117911552023
Diffusion Barriers for Germanium
Applied Materials, Inc.
0 cites
US117812182023
Defect Free Germanium Oxide Gap Fill
APPLIED MATERIALS, Inc.
0 cites
US117840422023
Carbon Hard Masks for Patterning Applications and Methods Related Thereto
APPLIED MATERIALS, Inc.
0 cites
US117696662023
Selective Deposition of Silicon Using Deposition-treat-etch Process
APPLIED MATERIALS, Inc.
0 cites
US117567852023
Molecular Layer Deposition Contact Landing Protection for 3D NAND
Applied Materials, Inc.
0 cites
US117323522023
Hydrogen Free Silicon Dioxide
APPLIED MATERIALS, Inc.
0 cites
US117027512023
Non-conformal High Selectivity Film for Etch Critical Dimension Control
Applied Materials, Inc.
0 cites
US117053352023
Conformal High Concentration Boron Doping of Semiconductors
Applied Materials, Inc.
0 cites
US116825542023
Catalytic Thermal Deposition of Carbon-containing Materials
Applied Materials, Inc.
0 cites
US116768132023
Doping Semiconductor Films
Applied Materials, Inc.
0 cites
US116768582023
High Bias Deposition of High Quality Gapfill
APPLIED MATERIALS, Inc.
0 cites
US116555372023
HDP Sacrificial Carbon Gapfill
Applied Materials, Inc.
0 cites
US116580262023
Conformal Silicon Oxide Film Deposition
Applied Materials, Inc.
0 cites
US116383742023
Multicolor Approach to DRAM STI Active Cut Patterning
Applied Materials, Inc.
0 cites
US116262782023
Catalytic Formation of Boron and Carbon Films
Applied Materials, Inc.
0 cites
US116211602023
Doped and Undoped Vanadium Oxides for Low-k Spacer Applications
APPLIED MATERIALS, Inc.
0 cites
US116212262023
Graphene Diffusion Barrier
APPLIED MATERIALS, Inc.
0 cites
US116159662023
Flowable Film Formation and Treatments
Applied Materials, Inc.
0 cites
US115944152023
PECVD Tungsten Containing Hardmask Films and Methods of Making
Applied Materials, Inc.
0 cites
US115944162023
Tribological Properties of Diamond Films
Applied Materials, Inc.
0 cites
US115784092023
Low Deposition Rates for Flowable PECVD
APPLIED MATERIALS, Inc.
0 cites
US115453542023
Molecular Layer Deposition Method and System
National University Of Singapore
0 cites