21 Patents
- US125753822026Methods and Mechanisms for Adjusting Chucking Voltage During Substrate Manufacturing
Applied Materials, Inc.
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- US122179372025Radio Frequency Source for Inductively Coupled and Capacitively Coupled Plasmas in Substrate Processing Chambers
Applied Materials, Inc.
0 cites - US122117282025Electrostatic Chuck Design with Improved Chucking and Arcing Performance
Applied Materials, Inc.
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- US116825742023Electrostatic Chuck Design with Improved Chucking and Arcing Performance
Applied Materials, Inc.
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