- US12398342utility2025Process Liquid Composition for Lithography and Pattern Forming Method Using Same0 cites
- US12305080utility2025Slurry Composition for Polishing Silicon Oxide Film, and Polishing Method Using Same0 cites
- US12105421utility2024Highly Thick Spin-on-carbon Hard Mask Composition and Patterning Method Using Same0 cites
- US12094719utility2024Etching Pattern Forming Method in Semiconductor Manufacturing Process0 cites
- US12050403utility2024Organic-inorganic Hybrid Photoresist Processing Liquid Composition0 cites
- US11970672utility2024Cleaning Liquid Composition for Semiconductor Wafer and Cleaning Method Using Same0 cites
- US11906900utility2024Chemically Amplified Positive Photoresist Composition for Improving Pattern Profile0 cites
- US11624984utility2023Process Liquid Composition for Extreme Ultraviolet Lithography and Pattern Forming Method Using Same0 cites
- US11586109utility2023Chemically-amplified-type Negative-type Photoresist Composition0 cites
- US11555150utility2023Etching Composition for Silicon Nitride Film0 cites