Patents/Assignees

WONIK IPS CO., Ltd.

19 patents in portfolio

US12581910utility2026
Substrate Processing Apparatus
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US12563801utility2026
Processing Method for Substrate
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US12563802utility2026
Processing Method for Substrate
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US12538732utility2026
Substrate Processing Apparatus and Substrate Processing Method
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US12465940utility2025
Substrate Processing Apparatus
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US12442077utility2025
Substrate Processing Apparatus
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US12377483utility2025
Method of Assembling Substrate Supporting Apparatus
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US12371783utility2025
Internal Chamber Processing Method and Substrate Processing Method
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US12249536utility2025
Substrate Supporting Assembly and Substrate Processing Apparatus
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US12243720utility2025
Gas Supply Block and Substrate-processing Apparatus Including the Same
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US12024777utility2024
Method of Processing Substrate
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US12027371utility2024
Substrate Processing Method
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US11965244utility2024
Substrate Processing Method, Substrate Processing Apparatus Using the Same, and Semiconductor Device Manufacturing Method
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US11967503utility2024
Method of Depositing Thin Film and Method of Manufacturing Semiconductor Device Using the Same
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US11875998utility2024
Substrate Processing Method
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US11823907utility2023
Processing Method for Substrate
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US11784029utility2023
Method and Apparatus for Atomic Layer Etching
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US11769681utility2023
Transfer Robot and Substrate Processing Apparatus Having the Same
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US11651960utility2023
Method for Forming Amorphous Silicon Thin Film, Method for Manufacturing Semiconductor Device Including Same, and Semiconductor Manufactured Thereby
0 cites