- US11692110utility2023Low Oxide Trench Dishing Chemical Mechanical Polishing0 cites
- US11667839utility2023Low Oxide Trench Dishing Chemical Mechanical Polishing0 cites
- US11670512utility2023Selective Deposition on Silicon Containing Surfaces0 cites
- US11649547utility2023Deposition of Carbon Doped Silicon Oxide0 cites
- US11643599utility2023Tungsten Chemical Mechanical Polishing for Reduced Oxide Erosion0 cites
- US11631580utility2023Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials0 cites
- US11626279utility2023Compositions and Methods for Making Silicon Containing Films0 cites
- US11605535utility2023Boron-containing Compounds, Compositions, and Methods for the Deposition of a Boron Containing Films0 cites
- US11591692utility2023Organoamino-polysiloxanes for Deposition of Silicon-containing Films0 cites
- US11584854utility2023Compositions and Methods for the Deposition of Silicon Oxide Films0 cites
- US11560533utility2023Post Chemical Mechanical Planarization (CMP) Cleaning0 cites
- US11549034utility2023Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions0 cites
← PreviousPage 4 of 4