- US12385137utility2025Method for Depositing Vanadium-containing Films0 cites
- US12378273utility2025Lanthanide and Lanthanide-like Transition Metal Complexes0 cites
- US12325844utility2025Photoresist Remover0 cites
- US12319637utility2025High Purity Ethylenediamine for Semiconductor Applications0 cites
- US12320001utility2025Compositions and Methods Using Same for Thermal Deposition Silicon-containing Films0 cites
- US12312684utility2025Siloxane Compositions and Methods for Using the Compositions to Deposit Silicon Containing Films0 cites
- US12297115utility2025High Temperature Atomic Layer Deposition of Silicon-containing Film0 cites
- US12298669utility2025Composition Comprising Three Alkanolamines and a Hydroxylamine for Removing Etch Residues0 cites
- US12264258utility2025Compositions Comprising Silacycloalkanes and Methods Using Same for Deposition of Silicon-containing Film0 cites
- US12226715utility2025Degassers, Degassing Systems and the Methods of Using Them0 cites
- US12230496utility2025Organoaminosilane Precursors and Methods for Depositing Films Comprising Same0 cites
- US12221692utility2025Compositions and Methods Using Same for Deposition of Silicon-containing Film0 cites
- US12205061utility2025Shared Data Induced Quality Control for a Chemical Mechanical Planarization Process0 cites
- US12110436utility2024Co/cu Selective Wet Etchant0 cites
- US12091581utility2024High Oxide Film Removal Rate Shallow Trench (STI) Chemical Mechanical Planarization (CMP) Polishing0 cites
- US12057310utility2024Functionalized Cyclosilazanes as Precursors for High Growth Rate Silicon-containing Films0 cites
- US12049695utility2024Compositions and Methods Using Same for Deposition of Silicon-containing Film0 cites