Patents/Assignees

TOKYO OHKA KOG YO CO., Ltd.

1 patent in portfolio

US11550221utility2023
Chemically Amplified Positive-type Photosensitive Resin Composition, Photosensitive Dry Film, Method of Manufacturing Photosensitive Dry Film, Method of Manufacturing Patterned Resist Film, Method of Manufacturing Substrate with Template, Method of Manufacturing Plated Article, and Nitrogen-containing Aromatic Heterocyclic Compound
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