Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11605539utility2023
Defect Correction on Metal Resists
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US11605712utility2023
Fabrication Process Flow of Dielectric Layer for Isolation of Nano-sheet Devices on Bulk Silicon Substrate
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US11602856utility2023
Vacuum Transfer Device and Substrate Processing System
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US11604097utility2023
Calibration Method and Calibration System
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US11604415utility2023
Substrate Processing Method, Substrate Processing Apparatus, and Computer Readable Recording Medium
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US11605536utility2023
Cyclic Low Temperature Film Growth Processes
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US11605547utility2023
Temperature Measuring Mechanism, Temperature Measuring Method, and Stage Device
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US11600490utility2023
Silicon Film Forming Method and Substrate Processing Apparatus
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US11600502utility2023
Substrate Liquid Processing Apparatus, Substrate Liquid Processing Method and Recording Medium
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US11600501utility2023
Etching Method and Plasma Processing Apparatus
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US11600500utility2023
Substrate Processing Method
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US11600499utility2023
Substrate Cleaning Method, Substrate Cleaning System, and Storage Medium
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US11600475utility2023
Plasma Processing Apparatus and Control Method
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US11600474utility2023
RF Voltage and Current (V-I) Sensors and Measurement Methods
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US11600471utility2023
Substrate Support, Plasma Processing Apparatus, and Focus Ring
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US11598007utility2023
Substrate State Determining Apparatus, Substrate Processing Apparatus, Model Generating Apparatus, and Substrate State Determining Method
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US11598001utility2023
Film Forming Method
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US11594418utility2023
Etching Method and Etching Apparatus
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US11594398utility2023
Apparatus and Method for Plasma Processing
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US11594535utility2023
High Performance Nanosheet Fabrication Method with Enhanced High Mobility Channel Elements
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