Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11640918utility2023
Stage Device, Power Supply Mechanism, and Processing Apparatus
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US11639947utility2023
Method of Detecting Foreign Object on Stage and Detection Apparatus
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US11640118utility2023
Method of Pattern Alignment for Field Stitching
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US11640911utility2023
Substrate Processing Method of Controlling Discharge Angle and Discharge Position of Processing Liquid Supplied to Peripheral Portion of Substrate
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US11640937utility2023
Horizontal Programmable Conducting Bridges Between Conductive Lines
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US11637031utility2023
Systems and Methods for Spin Process Video Analysis During Substrate Processing
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US11633969utility2023
Droplet Ejecting Apparatus and Droplet Ejecting Method in Which Relative Positions of Workpiece Table and Droplet Ejecting Head Are Corrected
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US11636579utility2023
Information Processing Method, Information Processing Apparatus and Computer-readable Recording Medium
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US11636585utility2023
Substrate Defect Inspection Apparatus, Substrate Defect Inspection Method, and Storage Medium
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US11637242utility2023
Methods for Resistive RAM (reram) Performance Stabilization via Dry Etch Clean Treatment
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US11637003utility2023
Method for Etching Film and Plasma Processing Apparatus
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US11637020utility2023
Etching Method and Plasma Etching Apparatus
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US11637025utility2023
Apparatus for Selectively Etching First Region Made of Silicon Nitride Against Second Region Made of Silicon Oxide
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US11637026utility2023
Substrate Liquid Processing Apparatus
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US11637035utility2023
Substrate Processing Apparatus with Moving Device for Connecting and Disconnecting Heater Electrodes and Substrate Processing Method Thereof
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US11629404utility2023
Method of Forming Tungsten Film and Controller
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US11630392utility2023
Substrate Processing Apparatus
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US11630397utility2023
Method for Producing Overlay Results with Absolute Reference for Semiconductor Manufacturing
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US11631607utility2023
Carrier and Jig
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US11631572utility2023
Plasma Processing Apparatus
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