Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11721557utility2023
Etching Method
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US11712710utility2023
Substrate Processing Apparatus and Substrate Processing Method
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US11715663utility2023
Bonding Apparatus, Bonding System, Bonding Method and Recording Medium
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US11714945utility2023
Method for Automated Standard Cell Design
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US11715630utility2023
Plasma Processing Apparatus
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US11715671utility2023
Film Forming System, Magnetization Characteristic Measuring Device, and Film Forming Method
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US11715643utility2023
Gas Phase Etch with Controllable Etch Selectivity of Metals
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US11715648utility2023
Substrate Processing Apparatus and Substrate Drying Method
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US11715650utility2023
Substrate Processing Apparatus and Manufacturing Method Therefor
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US11715654utility2023
Temperature Adjusting Device
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US11715657utility2023
Substrate Misalignment Detection Method, Substrate Position Abnormality Determination Method, Substrate Transfer Control Method, and Substrate Misalignment Detection Device
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US11710644utility2023
Etching Method and Plasma Processing Apparatus
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US11710643utility2023
Method of Etching and Plasma Processing Apparatus
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US11710633utility2023
Deposition Method and Deposition Apparatus
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US11710614utility2023
Light Interference System and Substrate Processing Apparatus
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US11702747utility2023
Rotation Driving Mechanism and Rotation Driving Method, and Substrate Processing Apparatus and Substrate Processing Method Using Same
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US11705374utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11705369utility2023
Fully Self-aligned via with Selective Bilayer Dielectric Regrowth
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US11705359utility2023
Substrate Transfer Mechanism and Substrate Transferring Method
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US11705356utility2023
Mounting Table and Plasma Processing Apparatus
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