Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US11823879utility2023
Film Formation Apparatus and Film Formation Method
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US11823880utility2023
Target Structure and Film Forming Apparatus
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US11823910utility2023
Systems and Methods for Improving Planarity Using Selective Atomic Layer Etching (ALE)
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US11823918utility2023
Substrate Processing Method and Substrate Processing Apparatus
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US11823922utility2023
Substrate Inspection Apparatus, Substrate Processing Apparatus, Substrate Inspection Method, and Computer-readable Recording Medium
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US11817337utility2023
Substrate Processing System and Substrate Processing Method
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US11817295utility2023
Three-phase Pulsing Systems and Methods for Plasma Processing
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US11817296utility2023
RF Voltage and Current (V-I) Sensors and Measurement Methods
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US11817321utility2023
Plasma Processing Apparatus and Plasma Processing Method
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US11817334utility2023
Substrate Processing Apparatus and Substrate Processing Method
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US11817335utility2023
Method and System for Inspecting Processing Apparatus
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US11817338utility2023
Bonding System and Bonding Method
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US11810800utility2023
Substrate Support, Test Device, and Method of Adjusting Temperature of Substrate Support
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US11807938utility2023
Exhaust Device, Processing System, and Processing Method
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US11810758utility2023
Plasma Processing Apparatus
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US11808696utility2023
Substrate Processing Apparatus and Substrate Processing Method to Suppress Alteration of Processing Liquid
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US11809091utility2023
Substrate Processing Apparatus and Processing Condition Adjustment Method
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US11810769utility2023
Piping Assembly and Substrate Processing Apparatus
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US11810791utility2023
Etching Method, Substrate Processing Apparatus, and Substrate Processing System
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US11810792utility2023
Etching Method and Substrate Processing Apparatus
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