Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12560863utility2026
Etching Method and Plasma Processing System
0 cites
US12563987utility2026
Plasma Processing Method and Plasma Processing System
0 cites
US12563979utility2026
Etching Method and Plasma Processing Apparatus
0 cites
US12563984utility2026
Semiconductor Device Manufacturing Method and Semiconductor Device Manufacturing System
0 cites
US12563990utility2026
Densification and Reduction of Selectively Deposited Si Protective Layer for Mask Selectivity Improvement in HAR Etching
0 cites
US12563988utility2026
Substrate Processing Method and Substrate Processing Apparatus
0 cites
US12562344utility2026
Plasma Processing Apparatus
0 cites
US12562349utility2026
Substrate Processing Apparatus
0 cites
US12562345utility2026
Monitoring Method and Plasma Processing Apparatus
0 cites
US12562340utility2026
Film Forming Method and Film Forming Apparatus
0 cites
US12562352utility2026
Prediction Method and Information Processing Apparatus for Predicting the Process Result in a Plasma Etching Process
0 cites
US12562354utility2026
Plasma Processing Apparatus and Temperature Controlling Method
0 cites
US12562343utility2026
Plasma Processing Method and Plasma Processing Device
0 cites
US12564027utility2026
Top-down Self-alignment of Vias in a Semiconductor Device for Sub-22nm Pitch Metals
0 cites
US12562348utility2026
Plasma Processing Apparatus
0 cites
US12553128utility2026
Particle Suppression Method
0 cites
US12553132utility2026
Gas Supply System, Substrate Processing Apparatus, and Operation Method for Gas Supply System
0 cites
US12553845utility2026
Holder Temperature Detection Method, Holder Monitoring Method and Substrate Processing Apparatus
0 cites
US12554205utility2026
Substrate Treatment System and Substrate Treatment Method
0 cites
US12555742utility2026
Plasma Processing Apparatus
0 cites

← PreviousPage 7 of 96Next →