Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12020936utility2024
Substrate Processing Apparatus and Substrate Processing Method
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US12017261utility2024
Processing Apparatus and Cleaning Processing Method
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US12018366utility2024
Substrate Processing Apparatus and Cleaning Method
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US12018368utility2024
Powder Transfer Apparatus, Gas Supply Apparatus, and Powder Removal Method
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US12018370utility2024
Film-forming Method and Film-forming Apparatus
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US12018371utility2024
Processing Apparatus and Processing Method
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US12018375utility2024
Flim Forming Method of Carbon-containing Film by Microwave Plasma
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US12018928utility2024
Film Thickness Measurement Method, Film Thickness Measurement Device, and Film Formation System
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US12020904utility2024
Apparatus for Processing a Substrate
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US12020898utility2024
Plasma Processing System and Method of Processing Substrate
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US12020899utility2024
Plasma Processing Apparatus and Plasma Processing Method
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US12020900utility2024
Plasma Processing Device, and Plasma Processing Method
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US12020902utility2024
Plasma Processing with Broadband RF Waveforms
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US12020913utility2024
Temperature Regulator and Substrate Treatment Apparatus
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US12020914utility2024
Optimizing Plasma Resources for Targeted Film
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US12020943utility2024
Substrate Processing Method and Substrate Processing Apparatus
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US12020968utility2024
Method for Adjusting Contact Position of Lift Pins, Method for Detecting Contact Position of Lift Pins, and Substrate Placement Mechanism
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US12020990utility2024
Method for Threshold Voltage Tuning Through Selective Deposition of High-k Metal Gate (HKMG) Film Stacks
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US12013429utility2024
Transport System, Inspection System, and Inspection Method
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US12014907utility2024
Method and Device for Forming Graphene Structure
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