Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12210292utility2025
Treatment Solution Supply Apparatus, Reporting Method, and Storage Medium
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US12209314utility2025
Substrate Liquid Processing Apparatus and Substrate Liquid Processing Method
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US12204256utility2025
Substrate Processing Apparatus
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US12202016utility2025
Substrate Cleaning Apparatus, Substrate Cleaning Method, and Non-transitory Computer-readable Recording Medium
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US12205817utility2025
Method for Depositing Film and Film Deposition System
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US12205801utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12205800utility2025
Plasma Processing Apparatus and Plasma Processing Method
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US12205799utility2025
Plasma Processing Apparatus
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US12204253utility2025
In-situ Lithography Pattern Enhancement with Localized Stress Treatment Tuning Using Heat Zones
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US12203021utility2025
Substrate Processing Device and Etching Liquid
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US12198963utility2025
Bonding System
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US12198954utility2025
Execution Device and Execution Method
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US12200826utility2025
Substrate Processing Apparatus and Noise Impact Reducing Method
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US12196700utility2025
Measuring Method, Measuring Device, and Measuring System
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US12198962utility2025
Maintenance Device, Vacuum Processing System, and Maintenance Method
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US12198961utility2025
Substrate Processing Apparatus and Substrate Processing Method
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US12198955utility2025
Substrate Transfer Method and Substrate Transfer System
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US12198952utility2025
Substrate Processing Apparatus
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US12198948utility2025
Substrate Processing Apparatus
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US12198947utility2025
Substrate Cleaning Method and Substrate Cleaning Device
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