Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12469696utility2025
Method of Forming 3-dimensional Spacer
0 cites
US12469694utility2025
Film Forming Method
0 cites
US12469685utility2025
Surface Modifying Apparatus and Bonding Strength Determination Method
0 cites
US12469684utility2025
Decompression Processing Method for Substrate Processing Apparatus and Substrate Processing Apparatus
0 cites
US12467742utility2025
Film Thickness Analysis Method, Film Thickness Analysis Device and Storage Medium
0 cites
US12466666utility2025
Method of Teaching Transfer Device, and Transfer System
0 cites
US12464704utility2025
Three-dimensional Plurality of N Horizontal Memory Cells with Enhanced High Performance Circuit Density
0 cites
US12463084utility2025
Shower Head and Substrate Processing Apparatus
0 cites
US12464703utility2025
3D Horizontal DRAM with In-situ Bridge
0 cites
US12463064utility2025
Substrate Processing Method and Substrate Processing Apparatus
0 cites
US12463060utility2025
Control Device, Substrate Processing System, and Method of Controlling Vacuum Valve Device
0 cites
US12463050utility2025
Methods for Wet Atomic Layer Etching of Molybdenum
0 cites
US12463048utility2025
Methods for Forming Semiconductor Devices Using Metal Hard Masks
0 cites
US12463041utility2025
Method and Apparatus for Forming Ruthenium Silicide Film on Surface of Substrate
0 cites
US12463025utility2025
Plasma Processing Apparatus
0 cites
US12463022utility2025
Placing Table and Substrate Processing Apparatus
0 cites
US12463021utility2025
Substrate Processing Apparatus and Maintenance Method for Substrate Processing Apparatus
0 cites
US12463013utility2025
Plasma Processing Apparatus
0 cites
US12462375utility2025
Methods to Automatically Adjust One or More Parameters of a Camera System for Optimal 3D Reconstruction of Features Formed Within/on a Semiconductor Substrate
0 cites
US12461455utility2025
Cleaning Method, Computer Storage Medium, and Substrate Treatment System
0 cites

← PreviousPage 16 of 96Next →