Patents/Assignees

TOKYO ELECTRON LIMITED

1,902 patents in portfolio

US12491600utility2025
Substrate Warpage Correction Method, Computer Storage Medium, and Substrate Warpage Correction Apparatus
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US12488991utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12488990utility2025
Etching Method and Plasma Processing Apparatus
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US12488970utility2025
Film Forming Apparatus and Method of Controlling Film Forming Apparatus
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US12488452utility2025
Wafer Bath Imaging
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US12487182utility2025
Non-intrusive Method for 2D/3D Mapping Plasma Parameters
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US12487129utility2025
Semiconductor Manufacturing Apparatus Including Temperature Sensor Inside Gas Pipe and Temperature Control Method Thereof
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US12486575utility2025
Apparatus for Processing Substrate, Gas Shower Head, and Method for Processing Substrate
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US12486570utility2025
Film Forming Method and Film Forming Apparatus
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US12486567utility2025
Film Formation Method and Film Formation Apparatus
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US12486565utility2025
Sputtering Apparatus and Control Method
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US12488961utility2025
Ignition Controlling Method, Film Forming Method, and Film Forming Apparatus
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US12488989utility2025
Method to Form Narrow Slot Contacts
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US12482702utility2025
Wet Etch Process and Methods to Form Air Gaps Between Metal Interconnects
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US12482695utility2025
Substrate Treatment Method and Substrate Treatment Device
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US12482667utility2025
Thermal Etching of Ruthenium
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US12482663utility2025
Processing Apparatus
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US12482651utility2025
Substrate Processing Method and Substrate Processing Apparatus
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US12482650utility2025
Film Formation Method
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US12482640utility2025
Cleaning Method, Substrate Processing Method and Plasma Processing Apparatus
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