Patents/Assignees

TOKUYAMA CORPORATION

94 patents in portfolio

US12466999utility2025
Silicon Etching Liquid, and Method for Producing Silicon Device and Method for Processing Silicon Substrate, Each Using Said Etching Liquid
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US12441620utility2025
Method for Producing Trichlorosilane and Method for Producing Polycrystalline Silicon Rod
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US12444617utility2025
Semiconductor Wafer Processing Liquid Containing Hypobromite Ions and PH Buffering Agent
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US12434265utility2025
Coating Method
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US12428297utility2025
Hexagonal Boron Nitride Powder and Method for Producing the Same
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US12428390utility2025
Chromene Compound and Photochromic Optical Article
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US12428517utility2025
Moisture Curable Polyurethane Composition and Laminate
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US12410095utility2025
Crystallization Method of Gypsum
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US12404172utility2025
Hydrogen Chloride Dehydration Method
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US12391613utility2025
Method for Reclaiming Gypsum from Wasted Gypsum Boards
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US12384678utility2025
Aluminum Nitride Powder and Method for Manufacturing the Same
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US12371237utility2025
Polycrystalline Silicon Lump, Packaging Body Thereof, and Method for Producing Same
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US12358663utility2025
Jig and Method for Manufacturing Boxed Body of Polycrystalline Silicon
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US12351466utility2025
Polycrystalline Silicon Material
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US12338548utility2025
Protective Structure for Silicon Rod and Method for Manufacturing Silicon Rod
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US12312247utility2025
Production Method for High-purity Hydrogen Chloride Gas
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US12297388utility2025
Photochromic Hydroxyurethane Compound
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US12286541utility2025
Surface-treated Sol-gel Silica and Method for Producing Same
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US12287450utility2025
Functional Laminate and Functional Lens Comprising the Functional Laminate
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US12288693utility2025
Etching Solution, Method for Treating Substrate with the Etching Solution, and Method for Manufacturing Semiconductor Device
0 cites

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