- US12112942utility2024Deposition Process for Forming Semiconductor Device and System0 cites
- US12111576utility2024Extreme Ultraviolet Photolithography Method with Infiltration for Enhanced Sensitivity and Etch Resistance0 cites
- US12106961utility2024Humidity Control or Aqueous Treatment for EUV Metallic Resist0 cites
- US12106034utility2024Rule Check Violation Prediction Systems and Methods0 cites
- US12106033utility2024Metal Cut Optimization for Standard Cells0 cites
- US12107007utility2024Recessed Contacts at Line End and Methods Forming Same0 cites
- US12107149utility2024Air Spacer and Method of Forming Same0 cites
- US12107041utility2024Metal Plate Corner Structure on Metal Insulator Metal0 cites
- US12107004utility2024In-situ CMP Self-assembled Monolayer for Enhancing Metal-dielectric Adhesion and Preventing Metal Diffusion0 cites
- US12107150utility2024Electroless Plating Method for Metal Gate Fill0 cites
- US12107131utility2024Gate-all-around Devices Having Self-aligned Capping Between Channel and Backside Power Rail0 cites
- US12107134utility2024Semiconductor Device and Fabrication Method Thereof0 cites
- US12107126utility2024Steep Sloped Vertical Tunnel Field-effect Transistor0 cites
- US12107045utility2024Middle-end-of-line Strap for Standard Cell0 cites
- US12106801utility2024Circuit for Reducing Voltage Degradation Caused by Parasitic Resistance in a Memory Device0 cites
- US12104268utility2024Treatment System and Method0 cites
- US12103133utility2024Chemical-mechanical Polishing Apparatus0 cites
- US12100625utility2024Semiconductor Device with Air Gaps Between Metal Gates and Method of Forming the Same0 cites
- US12100765utility2024Semiconductor Device Structure and Method for Forming the Same0 cites
- US12100745utility2024Dual Metal Capped via Contact Structures for Semiconductor Devices0 cites