- US12173736utility2024Gas Transport System0 cites
- US12171102utility2024Methods of Manufacturing Three-dimensional Memory Devices with Conductive Spacers0 cites
- US12171091utility2024Multi-layer High-k Gate Dielectric Structure0 cites
- US12170335utility2024Epitaxial Structures for Semiconductor Devices0 cites
- US12170323utility2024Nano Transistors with Source/drain Having Side Contacts to 2-D Material0 cites
- US12170321utility2024Fin Field Effect Transistor Having Conformal and Non-conformal Gate Dielectric Layers0 cites
- US12170274utility2024Semiconductor Packages and Methods of Forming Same0 cites
- US12170267utility2024Semiconductor Device and Method of Manufacture0 cites
- US12170246utility2024Semiconductor Device with Contact Structure0 cites
- US12170245utility2024Contact Features and Methods of Fabricating the Same in Fin Field-effect Transistors (finfets)0 cites
- US12170241utility2024Embedded Metal Insulator Metal Structure0 cites
- US12170231utility2024Gate-all-around Device with Trimmed Channel and Dipoled Dielectric Layer and Methods of Forming the Same0 cites
- US12170228utility2024Semiconductor Device and Methods of Manufacturing0 cites
- US12170218utility2024Method for Cleaning Electrostatic Chuck0 cites
- US12170203utility2024Integrated Circuit with Conductive via Formation on Self-aligned Gate Metal Cut0 cites
- US12170202utility2024Formation and In-situ Etching Processes for Metal Layers0 cites
- US12170199utility2024Cyclic Spin-on Coating Process for Forming Dielectric Material0 cites
- US12169369utility2024Storage for Extreme Ultraviolet Light Lithography0 cites
- US12165914utility2024Air Spacer Surrounding Conductive Features and Method Forming Same0 cites