Patents/Assignees

SHIN-ETSU CHEMICAL CO., Ltd.

605 patents in portfolio

US11757067utility2023
Synthetic Quartz Glass Cavity Member, Synthetic Quartz Glass Cavity Lid, Optical Device Package, and Making Methods
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US11749785utility2023
Resin Composition, Wavelength Conversion Material, Wavelength Conversion Film, LED Device, Backlight Unit, and Image Display Apparatus
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US11746078utility2023
Kinetic Resolution Reaction of a (1rs,2sr)-(2-hydroxy-3,5,5-trimethyl-3-cyclopentenyl)methyl Carboxylate Compound, a Process for Preparing Optically Active Trans-α-necrodyl Isobutyrate, and a Process for Preparing Optically Active Γ-necrodyl Isobutyrate
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US11746237utility2023
Organosiloxane Compound and Surface Treatment Agent
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US11742438utility2023
Solar Cell and Solar Cell Module
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US11739184utility2023
Polysiloxazane Compound Having Alkoxysilyl Group, Process for Producing Same, and Composition and Cured Product Including Same
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US11742439utility2023
Drying Method of Polyimide Paste and Manufacturing Method of Solar Cell Having High Photoelectric Conversion Efficiency
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US11732169utility2023
Silicone Adhesive Composition, Adhesive Tape, Adhesive Sheet and Double-sided Adhesive Sheet
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US11731992utility2023
Method for Preparing Halosilane Compounds
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US11731930utility2023
Processes for Preparing a (1,2-dimethyl-3-methylenecyclopentyl)acetate Compound and (1,2-dimethyl-3-methylenecyclopentyl)acetaldehyde
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US11733608utility2023
Resist Composition and Patterning Process
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US11723872utility2023
Granulated Composite, Rapid Release Tablet and Method for Producing Same
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US11724838utility2023
Method for Producing Polymer Tube Containing Liquid and Being Sealed at Constant Intervals and Apparatus for Producing Polymer Tube
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US11720019utility2023
Resist Composition and Pattern Forming Process
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US11720018utility2023
Chemically Amplified Resist Composition and Patterning Process
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US11717487utility2023
Enteric Coating Composition, Solid Preparation and Method for Producing Solid Preparation
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US11720021utility2023
Positive Resist Composition and Patterning Process
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US11720023utility2023
Material for Forming Organic Film, Method for Forming Organic Film, Patterning Process, and Compound
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US11720020utility2023
Resist Composition and Patterning Process
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US11709426utility2023
Resist Composition and Pattern Forming Process
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