Patents/Assignees

SHIN-ETSU CHEMICAL CO., Ltd.

605 patents in portfolio

US11851530utility2023
Material for Forming Organic Film, Patterning Process, and Polymer
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US11851544utility2023
Porous Water-soluble Nonionic Cellulose Ether Having Excellent Solubility and Method for Producing the Same
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US11851768utility2023
Film-forming Powder, Film Forming Method, and Film-forming Powder Preparing Method
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US11846884utility2023
Chemically Amplified Resist Composition and Patterning Process
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US11840456utility2023
Rare Earth Compound Particles and Method for Producing Rare Earth Oxide Particles
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US11839700utility2023
Bio-electrode Composition, Bio-electrode, and Method for Manufacturing a Bio-electrode
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US11839476utility2023
Bio-electrode Composition, Bio-electrode, and Method for Manufacturing a Bio-electrode
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US11840608utility2023
Silicone and a Method for Preparing the Same
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US11840511utility2023
Haloacetaldehyde Alkyl 2-cyclopentenyl Acetal Compound and a Process for Preparing the Same, a Process for Preparing a (2-cyclopentenyl)acetate Ester Compound Therefrom, and a Process for Preparing a (2-cyclopentenyl)acetic Acid Compound Therefrom
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US11834556utility2023
Organopolysiloxane Composition, and Organic Silicon Compound and Production Method Therefor
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US11835851utility2023
Substrate with Multilayer Reflection Film for EUV Mask Blank, Manufacturing Method Thereof, and EUV Mask Blank
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US11835853utility2023
Mask Blank Glass Substrate
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US11835860utility2023
Resist Composition and Patterning Process
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US11835859utility2023
Resist Composition and Patterning Process
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US11835815utility2023
Quantum Dot, Quantum Dot Composition, Wavelength Conversion Material, Wavelength Conversion Film, Backlight Unit and Image Display Device
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US11827799utility2023
Ultraviolet Curable Silicone Composition and Cured Product of Same
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US11829067utility2023
Resist Composition and Patterning Process
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US11820912utility2023
Fluoropolyether Group-containing Polymer-modified Organic Silicon Compound, Surface Treatment Agent, and Article
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US11822239utility2023
Resist Composition and Patterning Process
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US11822245utility2023
Resist Composition and Pattern Forming Process
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